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1

Delta lithography method to increase CD uniformity and throughput of SLM-based maskless lithography

Manseung Seo, Haeryung Kim

Journal:

Microelectronic Engineering

Year:

2010

Language:

english

File:

PDF, 500 KB

english, 2010

2

[IEEE 2006 SICE-ICASE International Joint Conference - Busan Exhibition & Convention Center-BEXCO, Busan, Korea (2006.10.18-2006.10.21)] 2006 SICE-ICASE International Joint Conference - Contamination Control Strategy based on Particle Flow Behavior near Fast Moving Devices in Flat Panel Display Fabrication Cleanroom

Chio, Hyunsik, Cho, Hyuntae, Kim, Giljun, Kim, Haeryung, Seo, Manseung

Year:

2006

Language:

english

File:

PDF, 6.33 MB

english, 2006

3

Lithography upon micromirrors

Manseung Seo, Haeryung Kim

Journal:

Computer-Aided Design

Year:

2007

Language:

english

File:

PDF, 2.53 MB

english, 2007

4

[IEEE 2006 SICE-ICASE International Joint Conference - Busan Exhibition & Convention Center-BEXCO, Busan, Korea (2006.10.18-2006.10.21)] 2006 SICE-ICASE International Joint Conference - Proposal of Distributed Architecture for Micromirror Image Generation in Maskless Optolithography System

Choi, Jaeman, Jin, Younghun, Kim, Haeryung, Seo, Manseung

Year:

2006

Language:

english

File:

PDF, 5.16 MB

english, 2006

5

Hybrid layering scanning-projection micro-stereolithography for fabrication of conical microlens array and hollow microneedle array

Kim, Haeryung, Moon, Seung Ki, Seo, Manseung

Journal:

Microelectronic Engineering

Year:

2015

Language:

english

File:

PDF, 7.57 MB

english, 2015

6

Spatial light modulation based 3D lithography with single scan virtual layering

Manseung Seo, Haeryung Kim

Journal:

Microelectronic Engineering

Year:

2011

Language:

english

File:

PDF, 687 KB

english, 2011

7

Influence of dynamic sub-pixelation on exposure intensity distribution under diffraction effects in spatial light modulation based lithography

Seo, Manseung, Kim, Haeryung

Journal:

Microelectronic Engineering

Year:

2012

Language:

english

File:

PDF, 978 KB

english, 2012

8

Systematic Approach to Contour-Parallel Tool Path Generation of 2.5-D Pocket with Islands

Seo, Manseung, Kim, Haeryung, Onosato, Masahiko

Journal:

Computer-Aided Design and Applications

Year:

2005

Language:

english

File:

PDF, 447 KB

english, 2005

9

Favorable Design Parameter to Control Contamination Associated in FPD Fabrication Cleanrooms

Seo, Manseung, Kim, Giljun, Kim, Haeryung

Journal:

Computer-Aided Design and Applications

Year:

2005

Language:

english

File:

PDF, 390 KB

english, 2005

10

[IEEE 2006 SICE-ICASE International Joint Conference - Busan Exhibition & Convention Center-BEXCO, Busan, Korea (2006.10.18-2006.10.21)] 2006 SICE-ICASE International Joint Conference - Micromirror based Lithography Simulation System based on Overlay Intensity Basis

Park, Kiwon, Choi, Jaeman, Kim, Haeryung, Seo, Manseung

Year:

2006

Language:

english

File:

PDF, 6.93 MB

english, 2006

11

[IEEE 2006 SICE-ICASE International Joint Conference - Busan Exhibition & Convention Center-BEXCO, Busan, Korea (2006.10.18-2006.10.21)] 2006 SICE-ICASE International Joint Conference - Lithographic Data Generation Algorithm based on Micromirror Cell Decomposition

Jin, Younghun, Park, Kiwon, Kim, Haeryung, Seo, Manseung

Year:

2006

Language:

english

File:

PDF, 5.18 MB

english, 2006

12

Proxy delta lithography method: Improving pattern fidelity and exposure dose effectiveness of spatial light modulation based lithography

Kim, Haeryung, Seo, Manseung

Journal:

Microelectronic Engineering

Year:

2014

Language:

english

File:

PDF, 1.12 MB

english, 2014

13

SPIE Proceedings [SPIE Photonics Asia - Beijing, China (Monday 5 November 2012)] Optical Design and Testing V - Parameters affecting pattern fidelity and line edge roughness under diffraction effects in optical maskless lithography using a digital micromirror device

Seo, Manseung, Lee, Taehyoung, Kim, Haeryung, Wang, Yongtian, Du, Chunlei, Hua, Hong, Tatsuno, Kimio, Urbach, H. Paul

Year:

2012

Language:

english

File:

PDF, 1.19 MB

english, 2012

14

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 24 February 2013)] Optical Microlithography XXVI - Adjustment of image decomposition mode and reflection criterion focusing on critical dimension uniformity and exposure dose effectiveness under diffraction effects in optical microlithography using a digital micromirror device

Seo, Manseung, Conley, Will, Kim, Haeryung

Year:

2013

Language:

english

File:

PDF, 2.35 MB

english, 2013

15

Extension of Pocket Machining to Direct Write Lithography

Seo, Manseung, Kim, Haeryung

Journal:

Computer-Aided Design and Applications

Year:

2006

Language:

english

File:

PDF, 905 KB

english, 2006

16

Maskless Lithographic Pattern Generation System upon Micromirrors

Seo, Manseung, Kim, Haeryung, Park, Myungjoo

Journal:

Computer-Aided Design and Applications

Year:

2006

Language:

english

File:

PDF, 716 KB

english, 2006